Webb套刻精度 (overlay,ovl)是指在光刻制造工艺中当层图形和前层图形的叠对位置精度。 由于集成电路芯片的制造是通过多层电路层叠加而成,如果当层和前层没有对准的话,芯片将无法正常工作。 因此保证当层和前层的套刻精度是极为重要的一件事情。 现有技术一般使用基于成像和图像识别的套刻测量技术 (imagebaseoverlay,ibo)量测套刻精度。 这种方 … Webb20 mars 2024 · Hence, a new methodology is explored to improve overlay measurement accuracy by Modeled-TIS (M-TIS). This paper discusses a new approach of harnessing …
Automated CD & Overlay measurement – EUMETRYS
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Imaging-based overlay metrology optimized by HV-SEM in 3D …
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